Macro Inspection Equipment Macro檢查設備

Equipment to perform macro surface inspections for thin-plate-like workpieces with high precision and speed. All transparent﹐ semi-transparent and non-transparent workpieces can be measured﹐ such as silicon wafers﹐ compound wafers.
Its unique optical system employs edge-reflected light and Mie scattering and achieves the highest level of sensitivity for macro inspections with a line sensor camera exclusively for ultra-low noise and an optimized telecentric optical system.
It can also check for uneven film thickness﹐ in addition to fine surface defects of nano-meter order. For applications such as defect classifications﹐ please consult us.
用於高精度，高速度地對薄板狀工件進行Macro表面檢查的設備。 可以測量所有透明，半透明和不透明的工件，例如矽晶片，複合片。
其獨特的光學系統利用邊緣反射光和散射，並通過專門用於超低噪聲的線傳感器相機和優化的遠心光學系統，實現了宏觀檢測的最高靈敏度。
除了細微的納米級表面缺陷，它還可以檢查膜厚不均。
  
用途：
　・ Surface inspection of silicon wafers
　・ Surface inspection of nanoimprinted substrates
　・ Surface inspection of photolithographic-processed substrates
  ・矽晶片的表面檢查
  ・納米壓印基材的表面檢查
  ・光刻處理基板的表面檢查諸如缺陷分類的應用，請諮詢我們。