Line-up Plasma Coating System by PRD 鍍膜設備

RPD (Reactive Plasma Deposition) System
•High-quality ITO/ZnO film under 200℃ low resistivity and high transparency under low temperature.
•RPD damage less TCP deposition system doesn’t have hig energy in the process.
•Material (tablet) feeding system realizes the vacuum running from 1-3 weeks.
•High throughput in-line system with ITO high-speed deposition rate.